Challenges of OPC Model Calibration from SEM ContoursGRANIK, Yuri; KUSNADI, Ir.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69221H.1-69221H.8, issn 0277-786X, isbn 978-0-8194-7107-9Conference Paper

Intensive 2D SEM model calibration for 45nm and beyondBAILEY, George E; DO, Thuy; GRANIK, Yuri et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 2, 61542W.1-61542W.10Conference Paper

SEM-Contour Based Mask ModelingVASEK, Jim; TEJNIL, Edita; KUSNADI, Ir et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69244Q.1-69244Q.11, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

SEM Image Contouring for OPC Model Calibration and VerificationTABERY, Cyrus; MOROKUMA, Hidetoshi; MATSUOKA, Ryoichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652019.1-652019.11, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper

The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and maskHIBINO, Daisuke; HOJYO, Yutaka; SHINDO, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7971, issn 0277-786X, isbn 978-0-8194-8530-4, 79712G.1-79712G.9, 2Conference Paper

High-precision contouring from SEM image in 32-nm lithography and beyondSHINDO, Hiroyuki; SUGIYAMA, Akiyuki; VAN DE KERKHOVE, Jeroen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72751F.1-72751F.9Conference Paper

The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and maskHIBINO, Daisuke; SHINDO, Hiroyuki; HOJYO, Yutaka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661S.1-81661S.9, 2Conference Paper

Circuit-based SEM contour OPC model calibrationPATTERSON, Kyle; VASEK, Jim; CHI MIN YUAN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211N.1-65211N.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Contour Oualitv Assessment for OPC Model CalibrationFILITCHKIN, Paul; DO, Thuy; KUSNADI, Ir et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72722Q.1-72722Q.7, 2Conference Paper